TOM3- Optical System Design, Tolerancing and Manufacturing


Oliver fahnle 1       

Oliver Fähnle

Sven schroder

Sven Schröder
Fraunhofer IOF

Marco hanft Marco Hanft

Carl Zeiss AG,
Jena (DE)


The topical meeting (TOM) on Optical System Design, Tolerancing and Manufacturing will highlight significant technology trends, emerging technologies and associated prospective developments in the field of optics design, tolerancing and fabrication. This TOM provides a forum for all aspects of optics design and fabrication, ranging from micro to large-scale optics and from high value one-off to mass-produced components including lessons learned papers on special design and manufacturing issues. One main goal of the meeting is to provide a better link between the design, the manufacturing, and the characterization of optical components and systems. Consequently, special attention will be paid to the collaboration between design and fabrication to generate cost-effective and manufacturable optical systems.


  • Optical and optomechanical system design and tolerancing
  • Optics Fabrication, from single piece to High-Volume Fab, sub-millimeter to meter optics, wafer-level optics
  • Optical modeling and Design methods
  • Upcoming technologies enabling innovative optical designs for new applications
  • Challenges of cost-effective manufacturability and testing methods based on a smart tolerancing process and well-adapted alignment strategies.
  • Testing, Specification, and Characterization of Light Scattering
  • Roughness, Shape, Defects, subsurface damage, MTF and mid-spatials
  • Finishing methods, e.g. SPDT, MRF, IBF, SLE, ductile grinding, FJP, laser polishing, CCP and traditional polishing
  • Optimization techniques in optics fabrication
  • Fabrication friendly Optical Design and Tolerancing – and vice versa
  • Optical coatings – challenges and solutions
  • Holistic design considering polishing and coating effects on surface properties, optical performance, and losses
  • Cleaning issues and strategies
  • Lessons learned producing high level aspheres and freeform optics
  • Education in optics design and fabrication
  • Start-up companies presenting their technologies
  • Optics for high-power laser applications


Program Committee

Jens Bliedtner, EAH Jena (DE) 

Prof Xujeun Zhang, Vice-President Changchun Institute of Optics (CN) 

Reinhard Völkel, SUSS MicroOptics SA (CH)

Matthias Beier, Space Optix (DE) 

Frank Frost, Ionenstrahlgestützte Technologien, Leibniz-Institut für Oberflächenmodifizierung e.V. (DE) 

Jessica DeGroote Nelson, Optimax (US) 

David Walker, University of Huddersfield (UK) 

Sven Kiontke, Asphericon (DE) 

Dae Wook Kim, University of Arizona (US)

Thomas Arnold, University of Leipzig (DE)

Jens Bliedtner, EAH Jena (DE) 

Alois Herkommer, Universität Stuttgart (DE) 

Stefan Bäumer, TNO (NL)

Andrew Boyd, Qioptiq Ltd. (UK)

Julie Bentley, University of Rochester (US)

Yongtian Wang, Beijing Institute of Technology (CN)

Yohei Fujishima, Nikon (JP)

Robert Bruening, IOF (DE)

Fabian Dürr (Fermat) (DE)

Prof. Holly, RWTH Aachen (DE)

Stefan Reichelt, ITO (DE)

Sebastian Riese, Layertec (DE)

Michael Heinicke, Carl Zeiss Jena (DE)

Invited Speakers

Jens Bliedtner

EAH Jena (DE)

Julie Bentley 

University of Rochester (US)

Tayyab Suratwala


Jessica DeGroote Nelson

Edmund Optics (US)

Daewook Kim

University of Arizona (US)