Optical System Design, Tolerancing and Manufacturing

Chairs

Oliver fahnle 1

Oliver Fähnle
PanDao (CH)
Sven schroder

Sven Schröder
Fraunhofer IOF (DE)
Marco hanft 24

Marco Hanft
Carl Zeiss AG, Jena (DE)

Synopsis

The topical meeting (TOM) on Optical System Design, Tolerancing and Manufacturing will highlight significant technology trends, emerging technologies and associated prospective developments in the field of optics design, tolerancing and fabrication. This TOM provides a forum for all aspects of optics design and fabrication, ranging from micro to large-scale optics and from high value one-off to mass-produced components including lessons learned papers on special design and manufacturing issues. One main goal of the meeting is to provide a better link between the design, the manufacturing, and the characterization of optical components and systems. Consequently, special attention will be paid to the collaboration between design and fabrication to generate cost-effective and manufacturable optical systems.

Topics

  • Optical and optomechanical system design and tolerancing
  • Metrology, from surfaces to systems
  • Optics Fabrication, from single piece to High-Volume Fab, sub-millimeter to meter optics
  • Systems engineering and architecture for optical systems
  • Optical design: modeling, methods, and solutions
  • Smart optics factory: modeling of optical fabrication and supply chains
  • AI used in optical systems generation
  • Progress in optics fabrication, metrology, and coating

Program Committee

Xuejun Zhang, Changchun Institute of Optics Fine Mechanics and Physics (CN)

Reinhard Völkel, SUSS MicroOptics SA (CH)

Matthias Beier, Space Optix (DE)

Frank Frost, Ionenstrahlgestützte Technologien, Leibniz-Institut für Oberflächenmodifizierung e.V. (DE)

Jessica DeGroote Nelson, Optimax (US)

David Walker, University of Huddersfield (UK)

Daewook Kim, University of Arizona (US)

Thomas Arnold, University of Leipzig (DE)

Jens Bliedtner, EAH Jena (DE)

Alois Herkommer, Universität Stuttgart (DE)

Stefan Bäumer, TNO (NL)

Andrew Boyd, Qioptiq Ltd. (UK)

Julie Bentley, University of Rochester (US)

Yongtian Wang, Beijing Institute of Technology (CN)

Kosuke Kita, Nikon (JP)

Henrik von Lukowicz, IOF (DE)

Fabian Duerr, Fermat (DE)

Carlo Holly, RWTH Aachen (DE)

Stefan Reichelt, ITO (DE)

Sebastian Riese, Layertec (DE)

Michael Heinicke, Carl Zeiss Jena (DE)

Reinhard Windemuth, Panasonic Connect Europe (DE)

Invited Speakers

Stefan Sinzinger

Technische Universität Ilmenau, Germany

Title: Unconventional ways of thinking about optical systems - A Tribute to the 100th Birthday of Prof. Adolf Lohmann

 

Vladan Blahnik

Friedrich-Schiller-University Jena, Germany

Title: The Lost Sixth Primary Aberration