TOM 3- Optical System Design, Tolerancing and Manufacturing

Chairs
 

Oliver fahnle 1 Oliver Fähnle,
FISBA AG (CH)
   
Sven schroder

Sven Schröder,
Fraunhofer IOF(DE)

   
Marco hanft Marco Hanft,

Carl Zeiss AG,
Jena (DE)

 

 

 

Synopsis

 

The topical meeting (TOM) on Optical System Design, Tolerancing and Manufacturing will highlight significant technology trends, emerging technologies and associated prospective developments in the field of optics design, tolerancing and fabrication. This TOM provides a forum for all aspects of optics design and fabrication, ranging from micro to large-scale optics and from high value one-off to mass-produced components including lessons learned papers on special design and manufacturing issues. One main goal of the meeting is to provide a better link between the design, the manufacturing, and the characterization of optical components and systems. Consequently, special attention will be paid to the collaboration between design and fabrication to generate cost-effective and manufacturable optical systems.

Topics

  • Optical and optomechanical system design and tolerancing
  • Optics Fabrication, from single piece to High-Volume Fab, sub-millimeter to meter optics, wafer-level optics
  • Optical modeling and Design methods
  • Upcoming technologies enabling innovative optical designs for new applications
  • Challenges of cost-effective manufacturability and testing methods based on a smart tolerancing process and well-adapted alignment strategies.
  • Testing, Specification, and Characterization of Light Scattering
  • Roughness, Shape, Defects, subsurface damage, MTF and mid-spatials
  • Finishing methods, e.g. SPDT, MRF, IBF, SLE, ductile grinding, FJP, laser polishing, CCP and traditional polishing
  • Optimization techniques in optics fabrication
  • Fabrication friendly Optical Design and Tolerancing – and vice versa
  • Optical coatings – challenges and solutions
  • Holistic design considering polishing and coating effects on surface properties, optical performance, and losses
  • Cleaning issues and strategies
  • Lessons learned producing high level aspheres and freeform optics
  • Education in optics design and fabrication
  • Start-up companies presenting their technologies
  •  Optics for high-power laser applications
     

SUBMIT

Program Committee

Xuejun Zhang

Changchun Institute of Optics (CN)

 

Reinhard Völkl

SUSS MicroOptics SA (DE)

 

Lars Jensen

Laser Centre Hannover (DE)

 

Marcus Trost

Fraunhofer IOF (DE)

 

Rolf Rascher

THD- Technische Hoschschule Deggendorf (DE)

 

Frank Frost

Ionenstrahlgestützte Technologien, Leibniz-Institut für Oberflächenmodifizierung e.V. (DE)

 

Jessica DeGroote Nelson

Optimax, Rochester (US)

David Walker

University of Huddersfield (UK)

 

Andreas Ettemeyer

NTB, Buchs (CH)

 

Dae Wook Kim

University of Arizona (US)

 

Thomas Arnold

Universität Leipzig (DE)

 

Alois Herkommer

Universität Stuttgart (DE)

 

Stefan Bäumer

TNO (NL)

 

Andrew Boyd

Qioptiq Ltd. (UK)

Julie Bentley

University of Rochester (US)

 

Yongtian Wang

Beijing Institute of Technology (CN)

 

Julius Muschaweck

JMO GmbH (DE)

 

Yasuhiro Ohmura

Nikon (JN)

 

Yohei Fujishima

Nikon (JN)

 

Irina Livshits

ITMO-University (RU)

 

Jyrki Kimmel

Nokia-Bell-Labs (FI)

Invited Speakers

Thomas Arnold

Universität Leipzig (DE)

 

Matthias Beier

Fraunhofer IOF (DE)  

 

Matrix Based Calculation of Aberrations in Non-Circular Symmetric Optical Systems

Herbert Gross

Friedrich-Schiller-Universität FSU, Jena (DE)

 

Kristina Uhlendorf

JABIL, Jena (DE)

 

David Walker

University of Huddersfield (UK)