Ultrafast Optical Technologies and Applications


Thomas sudmeyer Thomas Südmeyer
University of Neuchatel
Oliver heckl

Oliver Heckl

University of Vienna (AT)




The unique properties of ultrashort laser pulses have revolutionized numerous areas in science and industry. Most of these breakthroughs have been intrinsically tied to the successful development of state-of-the-art ultrafast technologies. The purpose of the TOM is to bring together both the developers and the users of ultrafast optical technologies. The focus of this topical meeting is an open discussion on the current statue-of-the-art and future developments, especially focusing on technological aspects. This overview on the advancements in generation and characterization of ultrafast optical pulses will enable a stimulating discussion of new research trends and emerging application fields.



  • Femtosecond and picosecond pulse generation from solid state, fiber, semiconductor and waveguide sources
  • Mode-locked lasers
  • Ultrafast amplifier technologies
  • Few-cycle optical pulse generation
  • Novel gain materials for ultrafast laser sources
  • Compression of ultrashort pulses
  • Supercontinuum generation based on ultrashort pulses
  • Characterization methods for ultrafast pulses
  • Shaping of femtosecond laser pulses
  • Carrier-envelope phase characterization and stabilization  
  • Ultrafast nonlinear parametric systems
  • Ultrashort-pulse mid-IR generation and applications
  • Ultrashort THz pulse generation and applications
  • New approaches for dispersion management
  • Technological aspects of micro-machining with ultrashort pulses
  • Technological aspects of advanced microscopy with ultrashort pulses
  • Technological aspects of attosecond pulse generation
  • Technological aspects of high harmonic generation
  • Technological aspects ultrafast spectroscopy
  • Emerging applications for ultrafast technology



Program Committee

Thomas Allison, Stony Brook University (US)

Fetah Benabid, Xlim (FR)

Giulio Cerullo, Politecnico di Milano (IT)

Hanieh Fattahi, Max Planck Institute (DE)

Almantas Galvanauskas, University of Michigan (US)

Patrick Georges, Laboratoire Charles Fabry de l'Institut d'Optique (FR)

Regina Gumenyuk, Tampere University of Technology (FI)

Christoph Heyl, DESY and Helmholzt Institute Jena (DE)

Constantin Häfner, Fraunhofer Institut für Lasestechnik ILT (DE)

Takuro Ideguchi, The University of Tokyo (JP)

Gil Porat, University of Alberta (CA)

Jan Rothhardt, Helmholtz Institute Jena (DE)

Lucile Rutkowski, Universite de Rennes (FR)

Grzegorz Sobon, Politechnika Wroclawska (PL)

Chaitanya Suddapalli, ICFO (ES)

Catherine Yuriko Teisset, TRUMPF Scientific Lasers GmbH+Co (DE)

Amelie Zair, King’s College London (UK)